R&D Engineering, Engineer

Key Responsibilities: Algorithm DevelopmentDevelop or optimize state-of-the-art machine learning (ML) and deep learning (DL) algorithms for mask synthesis applications. Feature EngineeringDesign and extract appropriate features from lithography data—including target pattern images, mask 2D/3D patterns, wafer resist 2D/3D images, and wafer etch 2D/3D images—for training ML/DL models. Model TrainingTrain ML/DL models using the extracted features from design, mask, and wafer data. Model DeploymentDeploy trained ML/DL models into mask synthesis software tools for production use. Skills and Qualifications: Technical ExpertiseProficient in ML/DL libraries such as TensorFlow and PyTorch.

Familiar with advanced models for image and vector data, including GANs, diffusion models, and Transformers. Learning and Problem-SolvingDemonstrates a strong desire to learn new technologies and possesses solid investigation and problem-solving skills. Domain KnowledgeHas a solid understanding of the specialization area (e. g. , computational lithography, ML/DL) and working knowledge of related domains. Creative Problem ResolutionResolves issues creatively and exercises independent judgment in selecting methods and techniques to develop solutions. Project ExecutionManages projects from start to finish, contributing to moderately complex aspects and developing actionable recommendations. Team CollaborationWorks effectively on team-based or task-oriented projects.

Collaborates with senior internal in the field.